Pulse & Hatch Overlap

For galvo scanning, scribing, and marking. This tool converts scan speed, repetition rate, and hatch spacing into pulse pitch, overlap, and pulses per spot. It also gives the effective pulse number that a Gaussian beam actually delivers to each point.

Inputs

%

Both optional. The target overlap gives the scan speed required. The area gives the hatch-fill time, excluding jumps and turnarounds.

Results

Pulse overlap1 − Δx/d—
Pulse pitchΔx = v/f—
Line (hatch) overlap1 − h/d—
Pulses per spot diameterd·f/v—
Effective pulses per point, single lineNeff,1D—
Effective pulses per point, hatched areaNeff,2D—
Area coverage ratev·h—
Hatch-fill time for area—
Scan speed for target overlap—

Spot layout (to scale)

Scan line 1Scan line 2 (offset by h)

How it is calculated

A pulsed laser moving at speed \(v\) and repetition rate \(f_\text{rep}\) places consecutive pulses a pitch \(\Delta x\) apart. Adjacent scan lines sit a hatch \(h\) apart:

\[ \Delta x = \frac{v}{f_\text{rep}}, \qquad \text{OL}_\text{pulse} = 1 - \frac{\Delta x}{d}, \qquad \text{OL}_\text{line} = 1 - \frac{h}{d}, \qquad N_\text{spot} = \frac{d}{\Delta x}. \]

Overlap is defined against the 1/e² diameter \(d = 2w_0\). Negative overlap means there are gaps between spots. The scan speed for a target overlap is \(v = d\,f_\text{rep}\,(1 - \text{OL})\).

Effective pulse number for a Gaussian beam

“Pulses per spot” counts circles, but a Gaussian beam delivers most of its fluence near the center. Summing the Gaussian fluence of every pulse that passes a point on the scan line gives the accumulated dose in units of the peak fluence \(F_0\):

\[ \sum_n e^{-2(x - n\Delta x)^2/w_0^2} \;\approx\; \frac{1}{\Delta x}\int_{-\infty}^{\infty} e^{-2x^2/w_0^2}\,dx \;=\; \sqrt{\frac{\pi}{2}}\,\frac{w_0}{\Delta x} \equiv N_\text{eff,1D}. \]

For a hatched area the same integral runs in two dimensions: \(N_\text{eff,2D} = \dfrac{\pi}{2}\dfrac{w_0^2}{\Delta x\,h}\). Summing the discrete pulses numerically confirms both expressions. When \(\Delta x \le w_0\), the point-to-point ripple in the sum stays within about ±1.5 %. At larger pitch the dose varies along the line and \(N_\text{eff}\) is only an average.

\(N_\text{eff}\) is the right pulse count to use with incubation models (\(F_\text{th}(N) = F_\text{th}(1)N^{S-1}\)). The accumulated fluence \(N_\text{eff}F_0\) is a useful dose metric for comparing scan strategies.

Worked example

A 30 µm spot scanned at 1 m/s with 100 kHz pulses and a 15 µm hatch:

\[ \Delta x = \frac{1000\ \text{mm/s}}{100\ \text{kHz}} = 10\ \mu\text{m}, \quad \text{OL} = 1 - \tfrac{10}{30} = 66.7\,\%, \quad N_\text{eff,1D} = 1.2533\times\tfrac{15}{10} = 1.88. \]

The line overlap is 50 %, so \(N_\text{eff,2D} = 2.36\). The coverage rate is 15 mm²/s, which fills 1 cm² in 6.7 s before jump and acceleration overhead. Reaching 90 % pulse overlap at the same repetition rate means slowing to 300 mm/s.

Choosing overlap in practice

Assumptions and limits

References

  1. J. M. Liu, “Simple technique for measurements of pulsed Gaussian-beam spot sizes,” Opt. Lett. 7, 196–198 (1982).
  2. W. M. Steen and J. Mazumder, Laser Material Processing, 4th ed., Springer (2010).